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TITANIUM ALLOY FORGED RING ASMESB381-F2 OD420xID280xH85mm #titanium #titaniumforgings https://www.cynfm.com/titanium-forgings/ti-forged-rings/gr7-titanium-forged-ring.html(在 Mayingchen, Shaanxi, China) https://www.instagram.com/p/CNEE4rhBuqe/?igshid=i36o0mtkcc14
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TC4 / GR5 titanium alloy deep hole processing pipe Φ 19*1.65*1500~ Φ 32 * 5.75 * 1500mm, welcome to inquire and process! Outer diameter ≥ 10mm Wall thickness ≥ 1.5mm Length ≤ 1500mm #titaniumtube #titanium #titaniumpipe (在 Mayingchen, Shaanxi, China) https://www.instagram.com/p/CWZeXbzJ7Wv/?utm_medium=tumblr
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The requirement of the target quality for sputter coating is higher than that of the traditional materials industry.
When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field, the impurity particles in the target will adhere to the substrate surface during the sputtering process. This will affect the film’s firmness, and even the film layer will fall off. Therefore, the higher the purity of the target, the better the performance of the coating film.
A titanium sputtering target that contains a concentration of oxygen in an amount of 20 ppm or less and has a maximum grain diameter of 20 μm or less. The target permits a sputtering operation to be accomplished substantially free from the formation of particles or the occurrence of an abnormal discharge phenomenon. In addition, the target contains a reduced amount of contaminants and is soft.
Cracks of Sputtering Target
For targets with poor thermal conductivity, such as SiAl targets, the heat transfer is hindered due to the target impurity, which causes cracking of the target during use. Under normal circumstances, slight cracks will not have a great impact on the coating production, but when the target has obvious cracks, the charge is very easy to concentrate at the edge of the crack, resulting in the abnormal discharge of the target. The discharge phenomenon will lead to the occurrence of slag, abnormal film formation, and increased product scrap. Therefore, in the process of preparing the target, the purity of the targets should be controlled.
Baoji Chenyuan Metal Material Co., Ltd. is a global sputtering targets manufacturer established in 2008. We specialize in producing high purity sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please visit our website https://www.cynfm.com/ for more information.
99.995% titanium target 99.99% target
Custom Titanium Target http://m.cynfm.com/sputtering-target/ https://www.instagram.com/p/CL593O2hVpr/?igshid=1bqtdbktxa4on
Used for 3D Printing Titanium Powder Titanium Rod
WeChat/WhatsApp:+86 17899176524 Baoji Chenyuan Metal Material Co., Ltd. titanium bar titanium forgings Sputtering target arya@cynfm.com www.cynfm.com
Chenyuan titanium has been recognized as one of the few companies with the manufacturing capacity and breadth of technology to supply the increasing demands for titanium and its alloys....
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