Titanium Alloy Upsetting And Forging 

The fifth batch of high-speed rail export Gr5 forgings was drawn for the second time at 1070°C. https://www.cynfm.com/titanium-forgings/（在 Mayingchen, Shaanxi, China） https://www.instagram.com/p/CM_PAKdHM3L/?igshid=1hdhvds67xip3

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A good titanium product needs to undergo strict forging and inspection, which is a must-do for the guys of Baoji Chenyuan Metals every day. https://www.cynfm.com/titanium-forgings/（在 Baoji） https://www.instagram.com/p/CPU_mR1h-7y/?utm_medium=tumblr

Titanium forgings（在 Mayingchen, Shaanxi, China） https://www.instagram.com/p/CMBVFvshfns/?igshid=yqdzidtik0pc

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About Titanium Sputtering Target

The requirement of the target quality for sputter coating is higher than that of the traditional materials industry.

When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field, the impurity particles in the target will adhere to the substrate surface during the sputtering process. This will affect the film’s firmness, and even the film layer will fall off. Therefore, the higher the purity of the target, the better the performance of the coating film.

A titanium sputtering target that contains a concentration of oxygen in an amount of 20 ppm or less and has a maximum grain diameter of 20 μm or less. The target permits a sputtering operation to be accomplished substantially free from the formation of particles or the occurrence of an abnormal discharge phenomenon. In addition, the target contains a reduced amount of contaminants and is soft.

Cracks of Sputtering Target

For targets with poor thermal conductivity, such as SiAl targets, the heat transfer is hindered due to the target impurity, which causes cracking of the target during use. Under normal circumstances, slight cracks will not have a great impact on the coating production, but when the target has obvious cracks, the charge is very easy to concentrate at the edge of the crack, resulting in the abnormal discharge of the target. The discharge phenomenon will lead to the occurrence of slag, abnormal film formation, and increased product scrap. Therefore, in the process of preparing the target, the purity of the targets should be controlled.

Baoji Chenyuan Metal Material Co., Ltd. is a global sputtering targets manufacturer established in 2008. We specialize in producing high purity sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please visit our website https://www.cynfm.com/ for more information.

99.995% titanium target       99.99% target